ZESTRON will participate in the upcoming SMTA China South Technical Conference at the Shenzhen Internation Exhibtion Center, which will be held during the NEPCON Shenzhen 2011. Visitors are invited to attend ZESTRON’s technical presentation on August 30th from 1:45 pm to 2:15 pm.
The topic this year is “pH-Neutral vs. Alkaline Cleaning Agents.” This collaborative study was conducted to compare the cleaning effectiveness of pH-neutral and alkaline technologies at low operating concentrations. The study employed the use of industry recognized Umpire (including IPC-B-24 test patterns) and IPC approved B52 test boards. While the most challenging component geometries were chosen, the authors also determined the need to quantify cleanliness to provide data that was not included in previous publications related to this topic. Extensive SIR, Ion Chromatography and analytical test data were accumulated to validate the visual residue analysis. As a secondary point of assessment, material compatibility effects were also examined. Particularly sensitive materials were chosen for exposure under worst case scenarios. They included but were not limited to anodized aluminum and certain nickel alloy substrates. Specialized, high resolution spectroscopic images were captured to ascertain close surface effects.
Furthermore, to learn about the FAST® technology based PCB cleaning agent ATRON® AC 207, customers are encouraged to visit ZESTRON’s booth (#1C40) at the NEPCON Shenzhen 2011. Our local engineering team will be readily available to answer all your questions regarding our innovative product and process technologies.