Allwin21 Corp. Products
SMT Products and Services offered by Allwin21 Corp.
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- Allwin21 Corp. Products
Professionally provide RTP, PLasma Asher,Descum,Etcher, Sputter deposition, Metal thin film thickness measurement equipment made in U.S.A. »»
Headquarters: Morgan Hill, California, USA
12 listed by Allwin21 Corp.
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Upgrade Kits for Used EquipmentThe Upgrade Kits include an advanced Allwin21 AW System Control with touch screen Graphic User Interface (GUI) and a new PC with Allwin21 real-time control Software. Most upgrade kits include new main control board, new wafer heating functions with Allwin21’s Advanced RTP technology, fixed ...
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AWgage-200 Metal Film MetrologyAWgage-200 measures sheet resistance in ohms per square or milliohms per square. If specific resistivity is known, the thickness of the deposited film layer can be computed from the sheet resistance. The choice of measurement data is easily get in the software. AWgage-200 can accommodat...
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AWgage-150 Metal Film MetrologyAWgage-150 measures sheet resistance in ohms per square or milliohms per square. If specific resistivity is known, the thickness of the deposited film layer can be computed from the sheet resistance. The choice of measurement data is easily get in the software. AWgage-150 can accommodate 150mm (6...
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AW-2001eR Microwave Plasma EtcherThe AW·2001R single-wafer Thin Films Etcher is an automated tool designed as a flexible downstream Microwave system for high-volume wafer fabrication. AW·2001R is in direct response to manufacturer's concerns for wafer damage. uniformity, uptime, reliability and produc...
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AW-B3000 Barrel Batch Plasma Asher Descum Equipmentsales@allwin21.com The AW-B3000 batch/barrel photoresist asher is a manual load tool designed as a flexible 13.56 MHz RF plasma photoresist removal system for high-volume wafer fabrication. The AW-B3000 is in direct response to manufacturer’s concerns f... |
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AccuThermo AW 810 Rapid Thermal Processing (RTA/RTP/RTO/RTN)The AccuThermo AW820 is production-proven stand alone atmospheric RTP (Rapid Thermal Processing) system, which uses high intensity visible radiation to heat single wafer for short process periods of time at precisely controlled temperatures. The process periods are typically 1‑900 seconds in dura...
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AccuThermo AW 810 Rapid Thermal Processing (RTA/RTP/RTO/RTN)sales@allwin21.com The AccuThermo AW810 was derived from the AG Associates 610 production-proven design. Allwin21 Corp. is the exclusive manufacturer of the AG Associates Heatpulse 610 desktop atmospheric RTP (Rapid Thermal Processing) system.&... |
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AccuThermo AW 610 Rapid Thermal Processing (RTA/RTP/RTO/RTN)sales@allwin21.com The AccuThermo AW610 was derived from the AG Associates 610 production-proven design. Allwin21 Corp. is the exclusive manufacturer of the AG Associates Heatpulse 610 desktop atmospheric RTP (Rapid Thermal Processing) system.&...
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AW-901eR AW-903eR Plasma Etcher Equipmentsales@allwin21.com The AW-901eR & AW-903eR single-wafer dry etchers are automated tools designed as a flexible 13.56MHz RF Parallel Plate plasma etching systems for high-volume wafer fabrication. AW-901eR & AW-903eR are in direct response to manufacturer’s...
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AW-105R Plasma Asher Descum Equipmentsales@allwin21.com The AW-105R single-wafer photoresist asher and descum is an automated tool designed as a flexible 13.56MHz RF Parallel Plate plasma photoresist removal and descum system for high-volume wafer fabrication. The AW-105R is in direct response to manufactu...
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AW-1008 Plasma Asher Equipmentsales@allwin21.com The AW-1008 single-wafer photoresist asher is an automated tool designed as a flexible downstream Microwave plasma photoresist removal system for high-volume wafer fabrication. The AW-1008 is in direct response to manufacturer’s concerns f...
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AccuThermo AW 410 Rapid Thermal Processing (RTA/RTP/RTO/RTN)The AccuThermo AW410 was derived from the AG Associates 610 production-proven design. Allwin21 Corp. is the exclusive manufacturer of the AG Associates Heatpulse 610 desktop atmospheric RTP (Rapid Thermal Processing) system. The system uses high intensity visible radiation to...
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