The growing complexity of electronics assemblies increases the cleaning challenge due to miniaturization, lower component gaps and improved flux designs. The need to remove ionizable contaminants is critical to production yields and reliability. As users source cleaning equipment and cleaning agents to meet these increased cleaning demands, a number of options must be considered such as batch vs. inline, cleaning agent designs, impingement options, controlling the cleaning agent, rinsing, drying and waste management.
The purpose of the research paper is to provide operational data for integrating aqueous cleaning equipment and cleaning agents for maximum performance. Conference participants will gain knowledge of batch and inline aqueous cleaning equipment designs, cleaning agents, energy sources for penetrating low residue gaps, air management, controlling the cleaning agent, managing rinse water and waste management.
Mike is CTO of Kyzen and current Chairperson of the IPC Cleaning and Alternatives Handbook and IPC/SMTA High Performance Cleaning Symposium.
Kyzen is a leading supplier of precision cleaning chemistries to the worldwide electronics, metal finishing, medical, semiconductor, and optical industries. Founded in 1990, Kyzen offers superior cleaning chemistries, technical support, application and analytical services throughout the world. Kyzen has won numerous industry awards for their exceptional products and all products are RoHS compliant. For more information, visit http://www.kyzen.com