The Process Cleaning Rate Theory holds that the static cleaning rate (chemical forces) plus the dynamic cleaning rate (mechanical forces) must be understood to deliver a clean part. The focus of this panel discussion is to provide users with an understanding of cleaning machines. Attendees will gain an understanding of the benefits and tradeoffs of cleaning machine options.
Topics addressed include machine design considerations to meet the evolving challenges of cleaning miniaturization in circuit designs and lead-free flux residues. The session will address fluid management and environmental considerations such as closed-loop processing and reduced fluid emissions. Cleaning fluid costs to operate the process, energy requirements, and footprint on the manufacturing floor also will be addressed.
For more information about the conference, visit http://www.ipc.org/CleaningConferenceBrochure. Visit http://www.ipc.org/CleaningConfSponsorshipApp for information about the sponsorship application, and http://www.ipc.org/CleaningConfTabletopApp for the tabletop application.