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News from ZESTRON Corporation


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  • Umut Tosun, ZESTRON, to Present “Concentration Monitoring Control in Batch and Inline Cleaning Machines” at the High-Reliability Cleaning and Conformal Coating Conference

Umut Tosun, ZESTRON, to Present “Concentration Monitoring Control in Batch and Inline Cleaning Machines” at the High-Reliability Cleaning and Conformal Coating Conference

Nov 06, 2014

ZESTRON, the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry, is pleased to announce that Umut Tosun, M.S.Chem.Eng., Application Technology Manager, ZESTRON, will present “Concentration Monitoring Control in Batch and Inline Cleaning Machines” at the High-Reliability Cleaning and Conformal Coating Conference sponsored by IPC and SMTA. This event will be held from November 18th to November 20th at the Chicago Marriott Schaumburg in Schaumburg, IL.

Accurately monitoring wash bath concentration in spray-in-air batch and/or inline cleaning machines is critical to the effectiveness of qualified cleaning processes.  It has been well documented that the refractive index measurement technique is a useful and reliable method, however, as the wash bath becomes contaminated, the refractive index reading will be skewed yielding an erroneous measurement.

As this phenomenon became understood, alternate manual technologies were developed.  The desire remained to identify an automated, accurate and reliable concentration monitoring technique.  Acoustic measurement technology has been proven to be capable of determining wash bath concentration reliably and accurately, and is relatively independent of pH, conductivity, and dissolved solids in some of the highest flux loaded wash baths.

In this presentation, comparative concentration data from refractive index, phase separation and the acoustic measurement methods will be reviewed and compared.  Additionally, the acoustic measurement data from multiple inline and batch applications, each incorporating various cleaning agents and flux types, will be presented.

Mr. Tosun will present during Session #3, “Cleaning Process Enhancement and Control to Promote Process Efficiency and Product Integrity” on Wednesday, November 19th. For more information on ZESTRON’s complete product line, process solutions and services, please visit our tabletop exhibit.  Our sales and engineering team stand ready to answer any questions you may have. 


Headquartered in Manassas, Virginia, and operating in more than 35 countries, ZESTRON is the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry. With six worldwide technical centers and the largest team of chemical engineers in the industry, ZESTRON’s commitment to ensuring that its customers surpass even the most stringent cleaning requirements is without equal.
For additional information and to tour one of our unparalleled technical centers, please visit www.zestron.com.

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Umut Tosun, ZESTRON, to Present “Concentration Monitoring Control in Batch and Inline Cleaning Machines” at the High-Reliability Cleaning and Conformal Coating Conference news release has been viewed 1287 times

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  • Umut Tosun, ZESTRON, to Present “Concentration Monitoring Control in Batch and Inline Cleaning Machines” at the High-Reliability Cleaning and Conformal Coating Conference
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