Oct 01, 2013 
ZESTRON, the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry, is pleased to announce that ZESTRON’s Application Technology Manager, Umut Tosun, M.S.Chem.Eng., will present “Concentration Monitoring & Closed Loop Control - A Technological Advancement” during the Advancements in Cleaning Process Controls session at SMTAI 2013.
Historically, refractive index, either in the form of hand held devices or automated systems, has been the tool of choice to measure the concentration of a solute in an aqueous solution. However, as the wash bath becomes contaminated with flux residue resulting from the cleaning process, the refractive index reading will be skewed yielding an erroneous measurement that could ultimately result in a false correction and an unstable process.
This study focuses on technological advancements made in concentration measurement and closed loop control utilizing new technology that can accurately measure aqueous cleaning agent concentration in the presence of flux loading. Comparative data will be presented confirming the reliability of this advanced process control methodology as compared to current methods.
“Concentration Monitoring & Closed Loop Control - A Technological Advancement” will be presented on Wednesday, October 16, from 4:00 PM to 5:30 PM EDT in room 202C at SMTAI 2013. To register for this session, please visit SMTA.org.
Headquartered in Manassas, Virginia, and operating in more than 35 countries, ZESTRON is the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry. With six worldwide technical centers and the largest team of chemical engineers in the industry, ZESTRON’s commitment to ensuring that its customers surpass even the most stringent cleaning requirements is without equal.
For additional information and to tour one of our unparalleled technical centers, please visit www.zestron.com.
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