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Engineered Material Systems Introduces DF-1014 Dry Film Negative Photoresist

Apr 04, 2013

 Engineered Material Systems, Inc., a leading global supplier of negative photo resist materials for MEMs and IC cooling applications, introduces the DF-1014 Dry Film Negative Photoresist for use in Micro-Electro-Mechanical Systems (MEMS). This material formulation has been optimized for hot roll lamination and processing on MEMS and IC wafers.

DF-1014 is available in various thickness formats from 5-50 μm, ±5 percent. The cured chemistry can withstand harsh environments including resistance to extreme moisture conditions and corrosive chemicals. The DF-1014 film is tougher (less brittle) than most negative photoresists in the market with a glass transition temperature of 145°C (by DMA Tan Delta) and a moderate modulus of 4.5 GPa at 25C. The cured chemistry is hydrophobic in nature, providing for chemical and moisture resistance.

DF-1014 is compatible with and can be used in contact with the EMS line of spin coatable photoresists. DF-1014 is the latest addition to Engineered Materials Systems’ full line of film and liquid negative photo resists formulated for making microfluidic channels on MEMS devices and integrated circuits.

For more information about the DF-1014 negative photo resists or to learn how Engineered Materials Systems can define, develop and create an engineered material solution that is right for your company, visit www.emsadhesives.com.


Engineered Materials Systems, Inc. (EMS) technology focus is on electronic materials for semiconductor, circuit assembly, photovoltaic, printer head, camera module, disk drive and photonics assembly product lines. The company creates continual improvements that will guide its customers into the future. For more information, visit www.emsadhesives.com.

 

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