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ZESTRON to Launch HYDRON® WS 325 at APEX 2012

Feb 16, 2012

ZESTRON, the worldwide leader in high precision cleaning products, services and training solutions for the electronics manufacturing industry, will launch its latest cleaning agent HYDRON® WS 325 at the IPC APEX 2012 (booth #3621) held at the San Diego Convention Center, San Diego, CA, from 2/28 until 3/1/12.  Show hours are from 10 am until 6 pm on Tuesday and Wednesday as well as 10 am until 2 pm on Thursday.

HYDRON® WS 325 is a revolutionary FAST® Technology based cleaning agent specifically designed for water-soluble (OA) defluxing spray-in-air inline and batch cleaning applications.  Applied at low concentrations (3% to 5%), the cleaning agent has been developed to penetrate the capillary spaces underneath low standoff components where DI-water only applications can no longer provide reliable cleanliness levels.  HYDRON® WS 325’s mild formulation is particularly gentle on all sensitive materials and solder joints.

For more information about this latest innovation and ZESTRON’s complete line of products and services, please visit our booth #3621 at the IPC APEX 2012.  Our sales and engineering team stands ready to answer any questions you may have. 

Additional information is also available on our website at http://www.zestron.com/us/smtnet-hydron-ws-325.html.


Headquartered in Manassas, Virginia, and operating in more than 35 countries, ZESTRON is the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry. With five worldwide technical centers and the largest team of chemical engineers in the industry, ZESTRON’s commitment to ensuring that its customers surpass even the most stringent cleaning requirements is without equal.

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