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ZESTRON to Host Free-of-Charge Webinar on "Cleaning Equipment & Cleaning Agents"

Feb 13, 2012

Ravi Parthasarathy, Senior Process Engineer, ZESTRON

Ravi Parthasarathy, Senior Process Engineer, ZESTRON

ZESTRON, the worldwide leader in high precision cleaning product, service and training solutions for the electronics manufacturing industry, is pleased to announce that the second 2012 webinar titled “Cleaning Equipment & Cleaning Agents” is scheduled for February 15th at 12 pm and February 23rd at 1:30 pm. This 45 minute webinar (including 15 min. Q&A) presented by Ravi Parthasarathy, Senior Process Engineer, ZESTRON, is free of charge and the second of a 10-part cleaning series ZESTRON @cademy will be hosting throughout 2012.  

What will you learn?

When implementing or upgrading a cleaning process, manufacturers have to ensure that the correct cleaning agent is chosen. There are many equipment choices available in the market depending on the throughput and production requirements. This webinar provides an overview of the modern cleaning technologies and which cleaning agent may be most suitable for a successful process. It also provides an overview of the various process options available as well as their advantages and disadvantages.

Who should attend?

The content of this webinar is geared towards production line operators, manufacturing and quality managers as well as process engineers within the electronics manufacturing industry.

For more information or to register, please contact ZESTRON at infoUSA@zestron.com, call (888) 999-9116 or visit our website at http://www.zestron.com/us/electronics/upcoming-events.html.


Headquartered in Manassas, Virginia, and operating in more than 35 countries, ZESTRON is the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry. With five worldwide technical centers and the largest team of chemical engineers in the industry, ZESTRON’s commitment to ensuring that its customers surpass even the most stringent cleaning requirements is without equal.

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