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ZESTRON to Showcase ‘More than Chemistry’ at the SMTA Capital Chapter Expo and Tech Forum

Sep 01, 2011

In addition to its complete portfolio of broad spectrum cleaning chemistries for the electronics manufacturing industry, ZESTRON will showcase its peripheral product lines, process solutions, services as well as training and workshop opportunities at the SMTA Capital Chapter Expo and Tech Forum held at the Johns Hopkins Applied Physics Lab on September 13th, 2011.  Show hours are from 8 am to 4 pm.

“ZESTRON is more than just chemistry,” says Michael McCutchen, Vice President Americas and South Asia, ZESTRON. “In addition to our superior line of cleaning agents for PCB, stencil, misprint, underside wipe and maintenance applications, we provide a complete solution package that consists of process support, engineering tools, vapor recovery devices, analytical and process optimization services as well as workshops and training. In fact, soon after the SMTA Capital Chapter Expo, we will be hosting a free-of-charge troubleshooting workshop at our US headquarters featuring seven presentations and hands-on training provided by some of the most well-known companies in the industry. These include Speedline, MPM, Kester, Sawa, DfR Solutions and SMT North America.”

For more information about ZESTRON’s cleaning process solutions, please visit us at our tabletop exhibit.  Our sales and engineering team stands ready to answer any questions you may have. To register for the SMTA Capital Chapter Expo and Tech Forum, please visit http://www.smta.org/chapters/chapters_detail.cfm?chapter_id=14. For more information about our upcoming free-of-charge workshop, please visit http://www.zestron.com/us/electronics/upcoming-events.html.


Headquartered in Manassas, Virginia and operating in over 35 countries, ZESTRON is the leading global provider of precision cleaning products and services. With the largest team of chemical engineers in the industry, ZESTRON leverages comprehensive capabilities to ensure customers surpass even the most stringent cleaning and vapor recovery requirements.

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