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ZESTRON’s HIGHLIGHT AT NEPCON SHENZHEN 2011

Aug 24, 2011

Before cleaning with ATRON® AC 207 - residues visible around solder joints.

Before cleaning with ATRON® AC 207 - residues visible around solder joints.

No residues visible after cleaning with ATRON® AC 207, at 15% concentration.

No residues visible after cleaning with ATRON® AC 207, at 15% concentration.

ZESTRON, the leading supplier of cleaning agents and services for SMT and Semicon Backend industry will exhibit ATRON® AC 207 during the upcoming NEPCON Shenzhen 2011 (booth #1C40).

ATRON® AC 207 is a FAST® Technology-based surfactant defluxing agent, specifically designed to provide a superior level of material compatibility with sensitive metals. With a bath life that is 3 to 10 times longer than that of conventional surfactants, ATRON® AC 207 offers excellent cleaning results in high and medium pressure inline as well as batch cleaning systems at low concentrations and temperatures. 

It removes a wide variety of the latest lead-free and eutectic flux residues as well as unsoldered solder pastes. FAST® Technology - Fast Acting Surfactant Technology - is an innovative surfactant-based cleaning technology developed and introduced by ZESTRON in 2007. FAST® Technology based cleaning agents are a proprietary mix of newly developed surfactants, which allows for a quicker removal of a wide variety of the latest lead-free and leaded flux residues.

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