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ZESTRON's Highlight at NEPCON Shenzhen 2011

Aug 08, 2011

ZESTRON, the leading supplier of cleaning agents and services for the SMT and Semicon Backend industries, will exhibit ATRON® AC 207 during the upcoming NEPCON Shenzhen 2011 (booth #1C40).

ATRON® AC 207 is a FAST® Technology-based surfactant defluxing agent, specifically designed to provide a superior level of material compatibility with sensitive metals. With a bath life that is 3 to 10 times longer than that of conventional surfactants, ATRON® AC 207 offers excellent cleaning results in high and medium pressure inline as well as batch cleaning systems at low concentrations and temperatures.  It removes a wide variety of the latest lead-free and eutectic flux residues as well as unsoldered solder pastes.

FAST® Technology- Fast Acting Surfactant Technology - is an innovative surfactant-based cleaning technology developed and introduced by ZESTRON in 2007. FAST® Technology-based cleaning agents are a proprietary mix of newly developed surfactants, which allows for a quicker removal of a wide variety of the latest lead-free and leaded flux residues.

For more information about ATRON® AC 207 or the FAST® Technology, please visit our booth (#1C40) at NEPCON Shenzhen.

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