As a first step towards a perceptual user interface, a computer vision color tracking algorithm is developed and applied towards tracking human faces. ...

This paper discusses the evolution of FA techniques from one generation of microprocessors to another. ...

This paper discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form of lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometers (nm) to......

To enable transistor scaling into the 21st century, new solutions such as high dielectric constant materials for gate insulation and shallow, ultra low resistivity junctions need to be developed....

This paper describes how the quality and reliability of Intel's products are designed, measured, modeled, and maintained....

Process 856 is a 0.25um-generation logic technology currently in volume manufacturing, which has been optimized for high performance, yield, and density. ...

Fine pitch SMT devices, although certainly not new, present more of an assembly processing challenge than 50 mil pitch devices. ...

This test utilizes an 8 mil laser cut stencil which is contact printed onto a 2 inch square coupon of copper foil that has been oxidized @ 150� C for 1 hour. ...

Small geometry resistors must be used where hybrid circuits try to compete in new, high density design applications. ...

Today's no-clean solder pastes offer many advantages that were not possible with products from the early days of no-clean. These new pastes open the process window and allow users to gain the advantages of no-clean, while minimizing headaches. ...