SMT Equipment

HYDRON® WS 400 - Aqueous-based Cleaning Medium for Defluxing

HYDRON® WS 400 - Aqueous-based Cleaning Medium for Defluxing

HYDRON® WS 400 - Aqueous-based Cleaning Medium for Defluxing

Name:

HYDRON® WS 400 - Aqueous-based Cleaning Medium for Defluxing

Category:

Cleaning Agents

Offered by:

ZESTRON Americas

View HYDRON® WS 400 - Aqueous-based Cleaning Medium for Defluxing on ZESTRON Americas website

Company Information:

ZESTRON Americas

The globally leading provider of high precision cleaning products, services and training solutions in the electronics and semiconductor manufacturing industries.

Manassas, Virginia, USA

Cleaning, Test Services, Training Provider

  • Phone (703) 393-9880
  • Fax (703) 393-8618

ZESTRON Americas website

Company Postings:

(13) products in the catalog

(5) upcoming training courses

(6) technical library articles

(313) news releases

HYDRON® WS 400 - Aqueous-based Cleaning Medium for Defluxing Description:

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ZESTRON FAST® (Fast Acting Surfactant Technology) Technology

HYDRON® WS 400, based on the FAST® Technology, is an aqueous based cleaning agent specifically designed to remove water-soluble (OA) flux residues from electronic assemblies and is compatible with sensitive metals. Applied at low concentrations (3% to 5%), the cleaning agent has been specifically developed to penetrate the capillary spaces underneath low standoff components, where DI-water only applications can no longer provide reliable cleanliness levels.

Advantages compared to other cleaners:

  • Facilitates the fast removal of a wide variety of the latest water-soluble (OA) flux residues, both leaded and lead-free
  • Non-foaming formula eliminates formation of “white scaling”
  • Excellent compatibility with sensitive metals and metal coatings
  • Gentle formulation leaves solder joints and pads shiny and bright
  • Ethanolamine-free
  • Halogen-free formulation
  • Low odor

Availability: HYDRON® WS 400 is available as a concentrate in 1L, 5L and 25L containers and 200L drums.


About FAST® Technology

"Fast Acting Surfactant Technology" (FAST®) is an innovative surfactant-based cleaning technology developed by ZESTRON. FAST® Technology based cleaning agents are a proprietary mix of newly developed surfactants, which allows for a quicker removal of a wide variety of the latest lead-free and leaded flux residues.

This new technology features shorter and more agile surfactant structures (each active ingredient has a short tail and multiple hydrophobic branches) enabling quick removal of flux residues while increasing the reliability and reproducibility of your cleaning results. When compared to traditional surfactant-based cleaning agents, this new technology provides much shorter contact times and requires reduced amount of active ingredients for the complete removal of contaminants. This in turn ensures a longer bath life associated with less process and maintenance costs. FAST® Technology's solid-free formula leaves no residues, neither on the substrates surface nor within the equipment.

View HYDRON® WS 400 - Aqueous-based Cleaning Medium for Defluxing on ZESTRON Americas website

HYDRON® WS 400 - Aqueous-based Cleaning Medium for Defluxing was added in Apr 2014

HYDRON® WS 400 - Aqueous-based Cleaning Medium for Defluxing has been viewed 1165 times

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