Surface Mount Technology Industry Directory

Surface Mount Technology companies


ZESTRON Corporation

Manufacturer of high precision cleaning products and services for all required applications in the electronics manufacturing industry.

Cleaning, Test Services

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MPC® Technology's cleaning properties allow a wide application range and power the complete removal of all contaminants from electronic substrate surfaces.

ZESTRON is the global market and technology leader for cleaning products and services for high precision cleaning applications. With the expertise gained through more than 25 years experience in precision cleaning, we develop customized solutions for your specific cleaning applications.

ZESTRON's unique MPC Technology (HMIS rating 0-0-0) gives water-based cleaning agents the performance of solvent-based cleaners. ZESTRON's state-of-the-art Application Technology Centers enable us to tailor our products specifically to your process requirements and provide the technical know-how for timely product quality assessments.

You can test all ZESTRON products free of charge at our three Technical Centers in Europe, America or Asia.

The Technical Centers with more than 35 cleaning machines from leading system manufacturers, offer you the opportunity to carry out free product trials in all types of systems.

Three main cleaning product groups currently are available:

Product name

Characteristics

Cleaning technology

Vigon - PCB cleaning chemistries

waterbased, surfactant-free

MPC® Technology

Zestron cleaning chemistries

water-free, solvent-based

Modern Solvents

Atron cleaning chemistries

surfactant-based

FAST® Technology

ZESTRON Services and Analytical Accessories

At ZESTRON's Analytical Center, you have the opportunity to evaluate the substrate surface cleanliness according to latest industry standards including IPC, MIL or J-STD employing a variety of test techniques.

Moreover, you'll also be provided with a comprehensive technical report providing detailed analyses of tests performed.  Wash bath quality can also be analyzed confirming specified concentration and effectiveness.

In addition, ZESTRON also provides tools/accessories that could be used to measure actual concentration of cleaning agents independent of dissolved contamination.  These tools includes manual methods using Bath Analyzers and automatic methods using the ZESTRON® EYE.

ZESTRON Corporation Postings
11 products »
PCB Cleaning Agents

Novel, innovative aqueous, semi-aqueous as well as solvent-based cleaning agents for printed circuit board defluxing processes are able to effectively remove all types of flux residues, ranging from RMA and OA to newly develope...

Cleaning

PCB Cleaning Agents
Stencil Cleaning Solutions

Stencil / Screen / Misprint Cleaning Solder pastes, SMT adhesives as well as thick film pastes, which are most commonly used during the assembly process, are typically applied via screens and stencils. Residues that are left behind...

Cleaning

Stencil Cleaning Solutions
Maintenance Cleaning Solutions

As part of a maintenance cleaning program, the most prevalent types of contamination, such as burnt-in fluxes and condensed gas emissions from the soldering process, must be removed to ensure a reliable and fai...

Cleaning

Maintenance Cleaning Solutions
ATRON® AC 207 Defluxing Agent

ATRON® AC 207 is a FAST® Technology-based cleaning agent specifically designed to operate at low concentration levels. The product was developed to improve the cleaning performance and bath life of traditional surfactan...

Cleaning

ATRON® AC 207 Defluxing Agent
VIGON® N 600 – PH-Neutral Defluxing Agent

Water-based, pH-neutral defluxing agent Based on the MPC® Technology, ZESTRON’s latest pH-neutral cleaning agent has been specifically developed for use at low operating concentrations in spray-in-air inline and batch cle...

Cleaning

VIGON® N 600 – PH-Neutral Defluxing Agent
HYDRON® WS 325 - Cleaning and Defluxing Agent

HYDRON® WS 325 is a FAST® Technology based cleaning agent specifically designed to remove water-soluble (OA) flux residues from electronic assemblies.  Applied at low concentrations, the cleaning agent has been specifica...

Cleaning

HYDRON® WS 325 - Cleaning and Defluxing Agent
VIGON® RC 101 - Cleaning Agent

Water-based Cleaning Medium for Reflow and Wave Solder Equipment. Based on the MPC® Technology, VIGON® RC 101 was specifically developed to remove all types of baked-on flux residues from reflow and wave solder equipment. I...

Cleaning

VIGON® RC 101 - Cleaning Agent
VIGON® A 250 - Water Based PCB Defluxing Agent

PCB Cleaning Medium with a Mild Formulation Especially for Sensitive Metal Alloys VIGON A 250 is a water-based MPC® cleaning agent designed to remove flux residues and solder pastes from electronic assemblies. Due to its mild f...

Cleaning

VIGON® A 250 - Water Based PCB Defluxing Agent
VIGON® US - Flux Removal Agent for PCB's

VIGON US is a water-based medium specifically developed for the use in ultrasonic, spray-under-immersion and centrifugal cleaning equipment. Based on MPC Technology, VIGON US removes all types of flux residues from electronic assemblies, cerami...

Cleaning

VIGON® US - Flux Removal Agent for PCB's
ZESTRON® EYE Automated Concentration Measurement System

The World’s First Automated Concentration Measurement System For Electronics Cleaning Processes The ZESTRON® EYE consists of a sensor and a controller that can be fully integrated with commonly used cleaning machine types...

Cleaning

ZESTRON® EYE Automated Concentration Measurement System
HYDRON® WS 400 - Aqueous-based Cleaning Medium for defluxing

HYDRON® WS 400, based on the FAST® Technology, is an aqueous based cleaning agent specifically designed to remove water-soluble (OA) flux residues from electronic assemblies and is compatible with sensitive metals. Applied at low concen...

Cleaning

HYDRON® WS 400 - Aqueous-based Cleaning Medium for defluxing
5 upcoming events »
Concentration Monitoring and Control Techniques Webinar

Type:

Online Webinar

Date:

Jun 18, 2015 - 01:30 PM - 02:30 PM

DI-water and Low Standoff Cleaning Challenges Webinar

Type:

Online Webinar

Date:

Jul 16, 2015 - 01:30 PM - 02:30 PM

Cleaning Process Efficiency: Static (SCR) and Dynamic (DCR) Cleaning Rates Webinar

Type:

Online Webinar

Date:

Aug 20, 2015 - 01:30 PM - 02:30 PM

Surface Analytics Webinar

Type:

Online Webinar

Date:

Sep 17, 2015 - 01:30 PM - 02:30 PM

pH Neutral vs Alkaline Cleaning Agents Webinar

Type:

Online Webinar

Date:

Oct 22, 2015 - 01:30 PM - 02:30 PM

5 technical articles »
Back to Basics – Why Clean?

Jun 28, 2011 | ZESTRON

ZESTRON America’s spring edition of ZESTRON News goes back to basics providing the latest information on the topics of cleaning in the electronics manufacturing industry....

Why Switch From Pure DI-Water to Chemistry

Dec 22, 2009 | Dr. Harald Wack, Umut Tosun, M.S.Chem.Eng., Dr. Joachim Becht, Dr. Helmut Schweigart

While most cleaning applications in the North American market rely on cleaning with DI-water only, for removing OA fluxes in first place, recent market studies show that water has reached its limitations in cleaning performance while favoring usage of aqueous processes. The term aqueous implies the use of aqueous-based chemistries with active ingredients and are usually diluted with DI-water. The nature of these active ingredients in the aqueous chemistries varies between manufacturer and his R&D knowledge. ...

Fluid Flow Mechanics Key To Low Standoff Cleaning

Sep 18, 2009 | Harald Wack, Ph.D., Umut Tosun, Naveen Ravindran, Sylvain Chamousset, Joachim Becht, Ph.D.; ZESTRON, Steve Stach, Austin American Technology Corp.

In recent years, various studies have been issued on cleaning under low standoff components; most however, with incomplete information. It is essential to revisit and describe the latest challenges in the market, identifying obvious gaps in available information. Such information is crucial for potential and existing users to fully address the cleanliness levels under their respective components. With the emergence of lead-free soldering and even smaller components, new challenges have arisen including cleaning in gaps of less than 1-mil....

Thermal Residue Fingerprinting: A Revolutionary Approach to Develop a Selective Cleaning Solution

Jul 01, 2009 | Steve Stach, Austin American Technology Harald Wack, Ph.D., Umut Tosun, Naveen Ravindran, ZESTRON America, John M. Radman, Daniel D. Phillips, Trace Laboratories East

During the last 5 years, the processes to remove flux residues especially for lead-free and challenging geometries have demonstrated new cleaning obstacles which have to be overcome.i A new methodology has been recently developed to further increase the propensity for successful cleaning.ii At the core of this method is the thermal identification of the residue matrix. Thermal energy changes the physical state, i.e. transitions between liquid, solid and gas phases. By taking advantage of such specific information during phase transitions, the cleaning process can be tailored to such settings, which in turn increases the cleaning success significantly....

Cleaning High-power Electronics

Jan 06, 2009 | Steve Stach, Austin America; Harald Wack, Ph.D., Naveen Ravindran, Zestron America; Joachim Becht, Zestron Europe

To prevent malfunctions in high-power electronics, flux residues must be removed from flip chip components prior to subsequent processes. As a result, integrating a suitable cleaning application into the manufacturing process of flip chip components is often required. Solvent based applications have re-emerged, and with that, an overall process solution is necessary....

221 news releases »
ZESTRON to Feature pH Neutral Process Solutions at SMTA Huntsville Expo and Tech Forum

May 27, 2015 | ZESTRON will be exhibiting the latest in pH neutral cleaning solutions at the SMTA Huntsville Expo and Tech Forum.

ZESTRON Academy to Host Collaborative Workshop “Assembly, Cleaning, Coating, and Reliability” in Illinois

May 21, 2015 | ZESTRON will host a free “Assembly, Cleaning, Coating, and Reliability” workshop together with Alpha, Stentech and HumiSeal. This collaborative one day workshop will be held in Schaumburg, IL, on June 23rd.

ZESTRON’s VIGON® EFM the AK-225 Alternative for Manual PCB Defluxing

May 18, 2015 | ZESTRON has the AK-225 alternative for manual PCB defluxing - VIGON® EFM.

pH Neutral Cleaning Solutions to be Showcased at SMTA Michigan and Oregon Expo and Tech Forum by ZESTRON

May 04, 2015 | ZESTRON will be exhibiting the latest in pH neutral cleaning solutions at the SMTA Michigan and SMTA Oregon Expo and Tech Forum.

Free Webinar “Power Modules Cleaning 101” Presented by ZESTRON Academy

Apr 29, 2015 | ZESTRON is pleased to announce the 3rd installment of ZESTRON’s 2015 webinar series, “Power Modules Cleaning 101” presented by ZESTRON Academy. This event will be held on May 14th, 1:30 PM EDT. Registration is required to attend.

ZESTRON Releases Spring 2015 Edition of ZESTRON News Featuring the Latest in pH Neutral Cleaning Solutions

Apr 21, 2015 | ZESTRON is pleased to announce the release of the Spring 2015 edition of the ZESTRON News. This edition features a technical study reviewing the performance and field data of pH neutral cleaning agents as compared to alkaline cleaning agent alternatives. The latest in pH neutral cleaning solutions, VIGON® PE 180 and HYDRON® SE 220, are introduced.

Naveen Ravindran, ZESTRON Application Engineer, to be a Panelist at the SMTA Atlanta 19th Annual Expo

Apr 15, 2015 | ZESTRON is pleased announce that Naveen Ravindran, M.S.Ch.E., Application Engineer, ZESTRON, will be a panelist for the cleaning session of the “Best Assembly Practices ‘Blue Ribbon’ Panel” at the SMTA Atlanta 19th Annual Expo. This event will be held at the Gwinnett Civic Center in Duluth, GA, on Wednesday, April 15th from 9:15 AM to 2:30 PM.

pH Neutral Process Solutions to be Showcased at SMTA Intermountain Expo and Tech Forum by ZESTRON

Apr 06, 2015 | ZESTRON will be exhibiting the latest in pH neutral cleaning solutions at the SMTA Intermountain Expo and Tech Forum. This event is scheduled to be held at Boise State University, Boise, ID, on Tuesday, April 7th, from 10:00 AM to 4:00 PM.

Advanced Webinar “High-Reliable Cleaning Process Optimization & Customer Requirements” Presented by ZESTRON Academy

Mar 30, 2015 | ZESTRON is pleased to announce the 2nd installment of ZESTRON’s 2015 webinar series, “High-Reliable Cleaning Process Optimization & Customer Requirements,” presented by ZESTRON Academy, will be held on April 16th, 1:30 PM EDT.

2015 Cleaning Webinar Series Released by ZESTRON Americas

Mar 26, 2015 | ZESTRON is pleased to announce the release of the 2015 Cleaning Webinar Series schedule. ZESTRON Academy continues to educate production line operators, manufacturing and quality managers as well as process engineers by providing detailed industry knowledge and troubleshooting techniques through workshops, webinars, onsite training, as well as an extensive international technical library. The webinar topics will be presented by ZESTRON Americas’ accredited experts, Umut Tosun, M.S.Ch.E, Application Technology Manager, and Ravi Parthasarathy, M.S.Ch.E., Senior Process Engineer.

211 more news from ZESTRON Corporation »

Contact information

ZESTRON Corporation

11285 Assett Loop
Manassas, Virginia, 20109
United States

  • Phone (703) 393-9880
  • Fax (703) 393-8618

Visit ZESTRON Corporation website

Europe

ZESTRON Europe

Bunsenstrasse 6
Ingolstadt, 85053, Germany

  • Phone +49-841- 635 90
  • Fax +49-841-635 40

East China

ZESTRON East China

1/F, Building 9,
Zun Xuan Industrial Park, Lane 1199, Ji Di Road, Minhang District,
Shanghai, 201107, China

  • Phone +86-21-5296-8185
  • Fax +86-21-5296 8186

South China

ZESTRON South China

1A/ Building B6, No. 3009 Guan Guang Rd.
Shenzhen, 518107, China

  • Phone +86-755-2342 0692
  • Fax +86-755-2342 0695

South Asia

ZESTRON South Asia

No. 22, Jalan Persiaran 1
Taman Kulim Avenue
Kulim, Kedah, 09000, Malaysia

  • Phone +6 04 403 5100
  • Fax +6 04 403 5101
Concentration Monitoring and Control Techniques