Surface Mount Technology Industry Directory

Surface Mount Technology companies


ZESTRON Corporation

Manufacturer of high precision cleaning products and services for all required applications in the electronics manufacturing industry.

Cleaning, Test Services

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Zestron - Technical Center: Cleaning equipment for PCB, stencil, maintenance cleaning

ZESTRON is the global market and technology leader for cleaning products and services for high precision cleaning applications. With the expertise gained through more than 25 years experience in precision cleaning, we develop customized solutions for your specific cleaning applications.

ZESTRON's unique MPC Technology (HMIS rating 0-0-0) gives water-based cleaning agents the performance of solvent-based cleaners. ZESTRON's state-of-the-art Application Technology Centers enable us to tailor our products specifically to your process requirements and provide the technical know-how for timely product quality assessments.

You can test all ZESTRON products free of charge at our three Technical Centers in Europe, America or Asia.

The Technical Centers with more than 35 cleaning machines from leading system manufacturers, offer you the opportunity to carry out free product trials in all types of systems.

Three main cleaning product groups currently are available:

Product name

Characteristics

Cleaning technology

Vigon - PCB cleaning chemistries

waterbased, surfactant-free

MPC® Technology

Zestron cleaning chemistries

water-free, solvent-based

Modern Solvents

Atron cleaning chemistries

surfactant-based

FAST® Technology

ZESTRON Services and Analytical Accessories

At ZESTRON's Analytical Center, you have the opportunity to evaluate the substrate surface cleanliness according to latest industry standards including IPC, MIL or J-STD employing a variety of test techniques.

Moreover, you'll also be provided with a comprehensive technical report providing detailed analyses of tests performed.  Wash bath quality can also be analyzed confirming specified concentration and effectiveness.

In addition, ZESTRON also provides tools/accessories that could be used to measure actual concentration of cleaning agents independent of dissolved contamination.  These tools includes manual methods using Bath Analyzers and automatic methods using the ZESTRON® EYE.

ZESTRON Corporation Postings
11 products »
PCB Cleaning Agents

Cleaning

Novel, innovative aqueous, semi-aqueous as well as solvent-based cleaning agents for printed circ...

Stencil Cleaning Solutions

Cleaning

Stencil / Screen / Misprint Cleaning Solder pastes, SMT adhesives as well as thick film paste...

Maintenance Cleaning Solutions

Cleaning

As part of a maintenance cleaning program, the most prevalent types of contamination, such as bur...

ATRON® AC 207 Defluxing Agent

Cleaning

ATRON® AC 207 is a FAST® Technology-based cleaning agent specifically designed to operate...

VIGON® N 600 – PH-Neutral Defluxing Agent

Cleaning

Water-based, pH-neutral defluxing agent Based on the MPC® Technology, ZESTRON’s lat...

HYDRON® WS 325 - Cleaning and Defluxing Agent

Cleaning

HYDRON® WS 325 is a FAST® Technology based cleaning agent specifically designed to remove...

VIGON® RC 101 - Cleaning Agent

Cleaning

Water-based Cleaning Medium for Reflow and Wave Solder Equipment. Based on the MPC® Techn...

VIGON® A 250 - Water Based PCB Defluxing Agent

Cleaning

PCB Cleaning Medium with a Mild Formulation Especially for Sensitive Metal Alloys VIGON A 250...

VIGON® US - Flux Removal Agent for PCB's

Cleaning

VIGON US is a water-based medium specifically developed for the use in ultrasonic, spray-under-im...

ZESTRON® EYE Automated Concentration Measurement System

Cleaning

The World’s First Automated Concentration Measurement System For Electronics Cleaning Proce...

HYDRON® WS 400 - Aqueous-based Cleaning Medium for defluxing

Cleaning

HYDRON® WS 400, based on the FAST® Technology, is an aqueous based cleaning agent specifi...

7 upcoming events »
Design and Executing a DOE for a High-Reliability Cleaning Process - Online Webinar

Type:

Seminar/Course

Date:

Apr 24, 2014 - 01:00 PM - 01:00 PM

Location:

Online, , United States

Surface Cleanliness Assessment - Online Webinar

Type:

Seminar/Course

Date:

May 22, 2014 - 01:05 PM - 02:00 PM

Location:

Online, , United States

Maintaining OSP Coating Integrity During the Cleaning Process - Online Webinar

Type:

Seminar/Course

Date:

Jun 19, 2014 - 01:00 PM - 02:00 PM

Location:

Online, , United States

Solutions for Difficult to Clean Components - Online Webinar

Type:

Seminar/Course

Date:

Jul 24, 2014 - 01:00 PM - 02:00 PM

Location:

Online, , United States

Technical Study: Cleaning Bottom Termination Components - Online Webinar

Type:

Seminar/Course

Date:

Aug 21, 2014 - 01:00 PM - 02:00 PM

Location:

Online, , United States

Cleaning Before Conformal Coating - Online Webinar

Type:

Seminar/Course

Date:

Sep 18, 2014 - 01:00 PM - 02:00 PM

Location:

Online, , United States

Technical Study: Concentration Monitoring & Control Techniques - Online Webinar

Type:

Seminar/Course

Date:

Oct 23, 2014 - 01:00 PM - 02:00 PM

Location:

Online, , United States

5 technical articles »
Back to Basics – Why Clean?

Jun 28, 2011 | ZESTRON

ZESTRON America’s spring edition of ZESTRON News goes back to basics providing the latest information on the topics of cleaning in the electronics manufacturing industry....

Why Switch From Pure DI-Water to Chemistry

Dec 22, 2009 | Dr. Harald Wack, Umut Tosun, M.S.Chem.Eng., Dr. Joachim Becht, Dr. Helmut Schweigart

While most cleaning applications in the North American market rely on cleaning with DI-water only, for removing OA fluxes in first place, recent market studies show that water has reached its limitations in cleaning performance while favoring usage of aqueous processes. The term aqueous implies the use of aqueous-based chemistries with active ingredients and are usually diluted with DI-water. The nature of these active ingredients in the aqueous chemistries varies between manufacturer and his R&D knowledge. ...

Fluid Flow Mechanics Key To Low Standoff Cleaning

Sep 18, 2009 | Harald Wack, Ph.D., Umut Tosun, Naveen Ravindran, Sylvain Chamousset, Joachim Becht, Ph.D.; ZESTRON, Steve Stach, Austin American Technology Corp.

In recent years, various studies have been issued on cleaning under low standoff components; most however, with incomplete information. It is essential to revisit and describe the latest challenges in the market, identifying obvious gaps in available information. Such information is crucial for potential and existing users to fully address the cleanliness levels under their respective components. With the emergence of lead-free soldering and even smaller components, new challenges have arisen including cleaning in gaps of less than 1-mil....

Thermal Residue Fingerprinting: A Revolutionary Approach to Develop a Selective Cleaning Solution

Jul 01, 2009 | Steve Stach, Austin American Technology Harald Wack, Ph.D., Umut Tosun, Naveen Ravindran, ZESTRON America, John M. Radman, Daniel D. Phillips, Trace Laboratories East

During the last 5 years, the processes to remove flux residues especially for lead-free and challenging geometries have demonstrated new cleaning obstacles which have to be overcome.i A new methodology has been recently developed to further increase the propensity for successful cleaning.ii At the core of this method is the thermal identification of the residue matrix. Thermal energy changes the physical state, i.e. transitions between liquid, solid and gas phases. By taking advantage of such specific information during phase transitions, the cleaning process can be tailored to such settings, which in turn increases the cleaning success significantly....

Cleaning High-power Electronics

Jan 06, 2009 | Steve Stach, Austin America; Harald Wack, Ph.D., Naveen Ravindran, Zestron America; Joachim Becht, Zestron Europe

To prevent malfunctions in high-power electronics, flux residues must be removed from flip chip components prior to subsequent processes. As a result, integrating a suitable cleaning application into the manufacturing process of flip chip components is often required. Solvent based applications have re-emerged, and with that, an overall process solution is necessary....

177 news releases »
ZESTRON to Host Collaborative Workshop “Assembly, Cleaning, Coating, and Reliability” in Argentina

Apr 16, 2014 | ZESTRON will be hosting an “Assembly, Cleaning, Coating, and Reliability” workshop together with Macon, Aqueous Technologies, Dow Corning, and Alpha in Argentina this May.

Latest Product Innovations HYDRON® WS 400 and Bath Analyzer 30 Introduced by ZESTRON at APEX 2014

Apr 11, 2014 | ZESTRONfeatured the ZESTRON® EYE, the latest innovation in concentration monitoring, and introduced two new products, HYDRON® WS 400 and ZESTRON® Bath Analyzer 30 at the 2014 IPC APEX EXPO in Las Vegas, NV.

Latest Product Innovations HYDRON® WS 400 and Bath Analyzer 30 Introduced by ZESTRON at APEX 2014

Apr 09, 2014 | ZESTRONfeatured the ZESTRON® EYE, the latest innovation in concentration monitoring, and introduced two new products, HYDRON® WS 400 and ZESTRON® Bath Analyzer 30 at the 2014 IPC APEX EXPO in Las Vegas, NV.

Advanced Webinar “Designing and Executing a DOE for a High-Reliability Cleaning Process” Presented by ZESTRON

Apr 03, 2014 | ZESTRON is pleased to announce the fourth session of ZESTRON Academy’s Ten-part 2014 Cleaning Webinar Series titled "Designing and Executing a DOE for a High-Reliability Cleaning Process."

Latest ZESTRON Products, HYDRON® WS 400 and ZESTRON® Bath Analyzer 30, to be featured at APEX 2014

Mar 20, 2014 | ZESTRON, is pleased to announce that ZESTRON will feature several new products at the IPC APEX 2014, booth #2035.

ZESTRON South Asia New Headquarters Expansion Increases Global Footprint

Mar 19, 2014 | ZESTRON is pleased to announce the purchase of a new facility located in Penang, Malaysia, expanding capabilities to the South Asia market.

Live Demonstrations of the ZESTRON® EYE to be held at IPC APEX 2014

Mar 12, 2014 | ZESTRON will host live demonstrations of the ZESTRON® EYE, the latest innovation in concentration measurement, at IPC APEX 2014, booth #2035.

Core Webinar “Cleaning Process Control” Presented by ZESTRON on March 20th

Mar 10, 2014 | ZESTRON, is pleased to announce the third installment of ZESTRON Academy’s Ten-part 2014 Cleaning Webinar Series titled “Cleaning Process Control.”

Naveen Ravindran, ZESTRON, to Present at the SMTA Dallas Expo and Tech Forum 2014

Feb 27, 2014 | ZESTRONis pleased to announce that Naveen Ravindran, M.S.Ch.E, Application Engineer, ZESTRON, will present “Determine Critical Cleaning Process Parameters for QFNs” at the SMTA Dallas Expo and Tech Forum on March 4th at the Plano Center, Plano, TX.

Naveen Ravindran, M.S.Ch.E
Axel Vargas Appointed as New Sales Engineer for ZESTRON’s Southeast Region

Feb 25, 2014 | ZESTRON announces the promotion of Axel Vargas to the position of Sales Engineer for ZESTRON's Southeast region.

Axel Vargas

167 more news from ZESTRON Corporation »

Contact information

ZESTRON Corporation

11285 Assett Loop
Manassas, Virginia, 20109
United States

  • Phone (703) 393-9880
  • Fax (703) 393-8618
  • E-mail

Visit ZESTRON Corporation website

Europe

ZESTRON Europe

Bunsenstrasse 6
Ingolstadt, 85053, Germany

  • Phone +49-841- 635 90
  • Fax +49-841-635 40
  • E-mail

East China

ZESTRON East China

1/F, Building 9,
Zun Xuan Industrial Park, Lane 1199, Ji Di Road, Minhang District,
Shanghai, 201107, China

  • Phone +86-21-5296-8185
  • Fax +86-21-5296 8186
  • E-mail

South China

ZESTRON South China

1A/ Building B6, No. 3009 Guan Guang Rd.
Shenzhen, 518107, China

  • Phone +86-755-2342 0692
  • Fax +86-755-2342 0695
  • E-mail

South Asia

ZESTRON South Asia

No. 22, Jalan Persiaran 1
Taman Kulim Avenue
Kulim, Kedah, 09000, Malaysia

  • Phone +6 04 403 5100
  • Fax +6 04 403 5101
  • E-mail
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