Surface Mount Technology companies
Manufacturer of high precision cleaning products and services for all required applications in the electronics manufacturing industry.
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MPC® Technology's cleaning properties allow a wide application range and power the complete removal of all contaminants from electronic substrate surfaces.
ZESTRON is the global market and technology leader for cleaning products and services for high precision cleaning applications. With the expertise gained through more than 25 years experience in precision cleaning, we develop customized solutions for your specific cleaning applications.
ZESTRON's unique MPC Technology (HMIS rating 0-0-0) gives water-based cleaning agents the performance of solvent-based cleaners. ZESTRON's state-of-the-art Application Technology Centers enable us to tailor our products specifically to your process requirements and provide the technical know-how for timely product quality assessments.
You can test all ZESTRON products free of charge at our three Technical Centers in Europe, America or Asia.
The Technical Centers with more than 35 cleaning machines from leading system manufacturers, offer you the opportunity to carry out free product trials in all types of systems.
Three main cleaning product groups currently are available:
At ZESTRON's Analytical Center, you have the opportunity to evaluate the substrate surface cleanliness according to latest industry standards including IPC, MIL or J-STD employing a variety of test techniques.
Moreover, you'll also be provided with a comprehensive technical report providing detailed analyses of tests performed. Wash bath quality can also be analyzed confirming specified concentration and effectiveness.
In addition, ZESTRON also provides tools/accessories that could be used to measure actual concentration of cleaning agents independent of dissolved contamination. These tools includes manual methods using Bath Analyzers and automatic methods using the ZESTRON® EYE.
Novel, innovative aqueous, semi-aqueous as well as solvent-based cleaning agents for printed circuit board defluxing processes are able to effectively remove all types of flux residues, ranging from RMA and OA to newly develope...
Stencil / Screen / Misprint Cleaning Solder pastes, SMT adhesives as well as thick film pastes, which are most commonly used during the assembly process, are typically applied via screens and stencils. Residues that are left behind...
As part of a maintenance cleaning program, the most prevalent types of contamination, such as burnt-in fluxes and condensed gas emissions from the soldering process, must be removed to ensure a reliable and fai...
ATRON® AC 207 is a FAST® Technology-based cleaning agent specifically designed to operate at low concentration levels. The product was developed to improve the cleaning performance and bath life of traditional surfactan...
Water-based, pH-neutral defluxing agent Based on the MPC® Technology, ZESTRON’s latest pH-neutral cleaning agent has been specifically developed for use at low operating concentrations in spray-in-air inline and batch cle...
HYDRON® WS 325 is a FAST® Technology based cleaning agent specifically designed to remove water-soluble (OA) flux residues from electronic assemblies. Applied at low concentrations, the cleaning agent has been specifica...
Water-based Cleaning Medium for Reflow and Wave Solder Equipment. Based on the MPC® Technology, VIGON® RC 101 was specifically developed to remove all types of baked-on flux residues from reflow and wave solder equipment. I...
PCB Cleaning Medium with a Mild Formulation Especially for Sensitive Metal Alloys VIGON A 250 is a water-based MPC® cleaning agent designed to remove flux residues and solder pastes from electronic assemblies. Due to its mild f...
VIGON US is a water-based medium specifically developed for the use in ultrasonic, spray-under-immersion and centrifugal cleaning equipment. Based on MPC Technology, VIGON US removes all types of flux residues from electronic assemblies, cerami...
The World’s First Automated Concentration Measurement System For Electronics Cleaning Processes The ZESTRON® EYE consists of a sensor and a controller that can be fully integrated with commonly used cleaning machine types...
HYDRON® WS 400, based on the FAST® Technology, is an aqueous based cleaning agent specifically designed to remove water-soluble (OA) flux residues from electronic assemblies and is compatible with sensitive metals. Applied at low concen...
Jun 28, 2011 | ZESTRON
ZESTRON America’s spring edition of ZESTRON News goes back to basics providing the latest information on the topics of cleaning in the electronics manufacturing industry....
Dec 22, 2009 | Dr. Harald Wack, Umut Tosun, M.S.Chem.Eng., Dr. Joachim Becht, Dr. Helmut Schweigart
While most cleaning applications in the North American market rely on cleaning with DI-water only, for removing OA fluxes in first place, recent market studies show that water has reached its limitations in cleaning performance while favoring usage of aqueous processes. The term aqueous implies the use of aqueous-based chemistries with active ingredients and are usually diluted with DI-water. The nature of these active ingredients in the aqueous chemistries varies between manufacturer and his R&D knowledge. ...
Sep 18, 2009 | Harald Wack, Ph.D., Umut Tosun, Naveen Ravindran, Sylvain Chamousset, Joachim Becht, Ph.D.; ZESTRON, Steve Stach, Austin American Technology Corp.
In recent years, various studies have been issued on cleaning under low standoff components; most however, with incomplete information. It is essential to revisit and describe the latest challenges in the market, identifying obvious gaps in available information. Such information is crucial for potential and existing users to fully address the cleanliness levels under their respective components. With the emergence of lead-free soldering and even smaller components, new challenges have arisen including cleaning in gaps of less than 1-mil....
Jul 01, 2009 | Steve Stach, Austin American Technology Harald Wack, Ph.D., Umut Tosun, Naveen Ravindran, ZESTRON America, John M. Radman, Daniel D. Phillips, Trace Laboratories East
During the last 5 years, the processes to remove flux residues especially for lead-free and challenging geometries have demonstrated new cleaning obstacles which have to be overcome.i A new methodology has been recently developed to further increase the propensity for successful cleaning.ii At the core of this method is the thermal identification of the residue matrix. Thermal energy changes the physical state, i.e. transitions between liquid, solid and gas phases. By taking advantage of such specific information during phase transitions, the cleaning process can be tailored to such settings, which in turn increases the cleaning success significantly....
Jan 06, 2009 | Steve Stach, Austin America; Harald Wack, Ph.D., Naveen Ravindran, Zestron America; Joachim Becht, Zestron Europe
To prevent malfunctions in high-power electronics, flux residues must be removed from flip chip components prior to subsequent processes. As a result, integrating a suitable cleaning application into the manufacturing process of flip chip components is often required. Solvent based applications have re-emerged, and with that, an overall process solution is necessary....
Feb 19, 2015 | ZESTRON is pleased to announce the addition of Roberto Fregoso as the Regional Sales Manager for Mexico and Central America and Andrés Turrubiates as the new Application Engineer serving ZESTRON’s Latin American customer base. In their new roles, they will focus on growing ZESTRON’s product and service business while expanding the current customer base. “Mr. Fregoso and Mr. Turrubiates are excellent additions to our global team,” says Todd Scheerer, Executive Vice President, ZESTRON Americas. “Their collective expertise and experience are essential as we continue to expand and broaden ZESTRON’s global reach.”
Feb 18, 2015 | ZESTRON is pleased to announce the addition of Eric Strating, as the new Director of Sales for the Americas. In his new role, Mr. Strating will continue to focus on growing ZESTRON’s product and service business while expanding the current customer base.
Feb 11, 2015 | ZESTRON services and training solutions for the electronics manufacturing industry, will feature the latest in pH neutral cleaning solutions at IPC APEX 2015 in San Diego, CA.
Feb 05, 2015 | ZESTRON is pleased to announce that Umut Tosun, M.S.Chem.Eng., Application Technology Manager, ZESTRON, will present “pH neutral Cleaning Agents – Market Expectation & Field Performance“ at the 2015 IPC APEX EXPO in San Diego, CA. The conference and exhibition will be held from February 24th to February 26th.
Jan 08, 2015 | ZESTRON, the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry, is pleased to announce that zestron.com is now available in Spanish.
Nov 12, 2014 | ZESTRON, the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry, is pleased to announce that Jigar Patel, M.S.Chem.Eng., Senior Process Engineer, ZESTRON, will present “Challenges and Solutions for the Effective Removal of OA Flux Residues” at the High-Reliability Cleaning and Conformal Coating Conference sponsored by IPC and SMTA. This event will be held from November 18th to November 20th at the Chicago Marriott Schaumburg in Schaumburg, IL.
Nov 06, 2014 | ZESTRON is pleased to announce that Umut Tosun, M.S.Chem.Eng., Application Technology Manager, ZESTRON, will present “Concentration Monitoring Control in Batch and Inline Cleaning Machines” at the High-Reliability Cleaning and Conformal Coating Conference sponsored by IPC and SMTA.
Oct 28, 2014 | ZESTRON is pleased to announce that Naveen Ravindran, M.S.Chem.Eng., Application Engineer, ZESTRON, will present “Determine Critical Process Parameters for QFNs” at the SMTA LA/Orange Expo and Tech Forum.
Oct 22, 2014 | ZESTRON is pleased to announce that Jigar Patel, M.S.Chem.Eng., Senior Process Engineer, ZESTRON, will present “Determine Critical Process Parameters for QFNs” at the SMTA Intermountain Expo and Tech Forum.
Oct 14, 2014 | ZESTRON is pleased to announce its successful first year launch of ZESTRON’s automatic concentration monitoring and controlling system.
11285 Assett Loop
Manassas, Virginia, 20109
Ingolstadt, 85053, Germany
ZESTRON East China
1/F, Building 9,
Zun Xuan Industrial Park, Lane 1199, Ji Di Road, Minhang District,
Shanghai, 201107, China
ZESTRON South China
1A/ Building B6, No. 3009 Guan Guang Rd.
Shenzhen, 518107, China
ZESTRON South Asia
No. 22, Jalan Persiaran 1
Taman Kulim Avenue
Kulim, Kedah, 09000, Malaysia