AP Batch Series Plasma Treatment Equipment

AP Batch Series Plasma Treatment Equipment Description:

The MARCH AP Batch Series system offers high-performance plasma treatment for batch manufacturing and R&D environments.

The AP-300, AP-600, and AP-1000 plasma treatment systems suit various plasma cleaning, surface activation, and adhesion improvement applications. The systems deliver exceptionally uniform plasma cleaning and treatment for semiconductor manufacturing, microelectronic packaging and assembly, and medical device manufacturing. Expand from an R&D environment to production with process correlation, controller continuity, and reliable, reproducible vacuum gas plasma treatment.

• Flexible batch processing – Indispensable, compact plasma systems with flexible shelf architecture to support batch processing of various part carriers in direct or downstream plasma mode. Ideal for a range of markets and applications.

The AP Batch Series:

• Compact system chassis and 13.56 MHz RF generator with impedance matching for unparalleled process repeatability.
• Supports a range of process gases, including argon, oxygen, nitrogen, helium, and fluorinated gases.
• An intuitive touchscreen control panel for real-time access to process and production data for statistical process control.
• Two standard electronic mass flow controllers for optimal gas control, with an option for one additional controller.
• Removable and adjustable powered or grounded shelves for various piece parts, components, and part carriers, including magazines, trays, and Auer® boats.
• Durable, high-quality construction and fixtures.